In case of Layer by Layer method of silver nanoparticles deposition, druring last month I confinred the deoposition condition.
As preliminary cleaning and activation of the polished silicon substrates the mixture of sulfuric acid and hydrogen peryoxide (2:1 vol.) was used.
Polyelectrolyte solution was 500ppm PAH solution. Variuos ionic strength of solution were tested. (1e-4, 1e-3,1e-2 and 0,15M addjusted with sodium chloride)
The highest ionic strength resulted in highest nanopartices concetration.
Also comparison beteewn PAH and PLL were performed. The test indicated that PAH is a better choice.

My work with simulation software were concentrated on modiffication of the model and the script code which enables me in the future investigation of absorption enhancement in silicon with metalic nanoparticles.