On 3-4 December 2012, I participated in a meeting Join PhD Seminar, which was attended by PhD students from the Institute of Metallurgy and Materials Science and Enano group belonging to Institute of Materials Science of Technical University of Dresden. The whole meeting was held in Radeburg. It was the first meeting organized by those two institutes. Each of the participants presented the achievements in his researches connecting with doctoral thesis. The topic of my presentation was "Wet chemical surface of crystalline silicon texturisation for photovoltaics."
On 5-6 December 2012 I participated in the Nano-scale and Advanced Materials Characterization Techniques training organized by the Deutsche Gesellschaft für Materialkunde eV, supported by the Dresden Fraunhofer Cluster Nanoanalysis (DFCNA) and The Federation of European Materials Societies (FEMS). The training was devoted to nanostructural researches in materials science and engineering. Analytical high-resolution techniques are important for the new nanotechnology and thin film technology. Nanoanalyze is increasingly necessary for the correct characterization of nanostructured materials in the production, as well as for understanding the nanostructure of materials. Specific use of the available methods shows that often a combination of several techniques of analysis is necessary to ensure that both the process control in nanotechnology, as well as the performance and reliability of new products. Many new developments in the field of imaging and nanoanalyze allows structural and chemical characteristics of <100 nm, up to atomic dimensions.