Recently, I was concentrated on colloidal solutions. I obtained new suspension of 100-120nm nanoparticles with high concentration. I tried other solutions as well. But only with this mentioned I obtained clearly visible change in appearance of silicon wafer after particles deposition. The solution had to be even disolved to enable control of deposition process.
SEM measurements revealed 4,5 and 7% of surface coverage, unfortunaltely with significant percentage of aggromerated particles. Measured reflection after NPs deposition law lowered considerably when compare to silicon wafer without the nanoparticles. Obtained reflection was lower, than expected from FDTD sumulations.