May was the month extreme full of work. I finally completed writing a dissertation paper. I have done missing EBSD/SEM measurements for recrystallized samples of Al-Zr.
I also passed exams on philosophy and foreign language.

May was dedicated to HUVECs seeding on the surface of variuos samples modified by nanoparticles and 24 bl PLL/HA cross-linked or non-cross-linked films for Impact R assay. I prepared coatings for tribological measurements and PACVD modification for my forthcoming visit in Leoben.

The microstructure inhomogeneity, like group of several adjacent grains cut by the shear bands, is typical for the deformed material (see Fig. 3). Deformation process significantly refines the grains. The area-weighted average grain size of the sample deformed to 13% is ca. 8.3 μm. We observed that the deformation close to the CDL (in the examined alloy ca. 55%) can lead to microstructure with grain size below 2 μm, containing considerable amount of twins.

In this study we adopted the Rodriguez parameterization for description of preferred twin variants in the orientation space. The Rodriguez-Frank orientation space for hexagonal 6/mmm lattice filled with ca. 〖10〗^4 vectors is presented in Fig. 2 [10,11]. The main axes of this coordinate system (R1, R2 and R3) correspond to sample's coordinate system (X, Y, Z). The R1 and R2 values are restricted to range ±1 and R3 is restricted to range ±(2-√3). The presented vectors have minimum length of 0.7 and can be considered as crystallites' orientations transforming sample coordinate systems to crystal ones by the rotations around these vectors by angles between 69.98° and 93.84° [11]. The orientation distribution presented in Fig. 1 is characteristic for extruded hexagonal metals and alloys (like Ti and Mg and its alloys [6,12]).

Recently, I was concentrated on colloidal solutions. I obtained new suspension of 100-120nm nanoparticles with high concentration. I tried other solutions as well. But only with this mentioned I obtained clearly visible change in appearance of silicon wafer after particles deposition. The solution had to be even disolved to enable control of deposition process.
SEM measurements revealed 4,5 and 7% of surface coverage, unfortunaltely with significant percentage of aggromerated particles. Measured reflection after NPs deposition law lowered considerably when compare to silicon wafer without the nanoparticles. Obtained reflection was lower, than expected from FDTD sumulations.